Hafnium Nitride Powder, HfN
Hafnium nitride; Hafnium nitride HfN
Properties: gray powder, cubic crystal structure. Melting point 3310℃, microhardness
16GPa. Quite stable, but easy to aqua regia, concentrated sulfuric acid, hydrofluoric
acid corrosion. High purity, small particle size, uniform distribution, large specific surface
area, high surface activity, gray powder, cubic crystal structure. Microhardness 16GPa.
Produced by a direct reaction of hafnium and nitrogen at 900℃, or by a reaction of
hafnium halides and ammonia or a mixture of nitrogen and hydrogen. Hafnium alloy
is an important component of refractory compound.
Product application:
Hafnium nitride has excellent mechanical, electrical, optical, high temperature and
corrosion resistance characteristics, and has very important applications in the field
of mechanical manufacturing and microelectronics. Hafnium nitride nanometer can
be widely used in semiconductor, photoelectric and machining fields. Because of
the integration of a variety of excellent mechanical, thermal, optical and corrosion
wear resistance characteristics, the hafnium nitride nanometer film is expected to
become an efficient optical window anti-reflection protection coating material, can
be used in aerospace key optical devices. HfN is a new type of hard material with
high melting point, high hardness, wear resistance and oxidation resistance. It can
be used as protective layer for technical and decorative fields, abrasion resistant
outer film for cutting tools, chemical inert film and high temperature resistant protective
film.